Preface to the Reissue ofthe Materials Characterization Series

Preface to Series

Preface to the Reissue of Characterization of Optical Materials

Preface

Contributors

INTRODUCTION

PART 1 INFLUENCE OF SURFACEMORPHOLOGYAND

MICROSTRUCTURE ON OPTICAL RESPONSE

CHARACTERIZATION OF SURFACE ROUGHNESS

1.1 Introduction

1.2 WhatSurfaceRoughnessls

1.3 HowSurfaceRoughness AffctsOpticaIMeasurements

1.4 How Surface Roughness and ScatteringAre Measured

1.5 Characterization ofSelected Surfaces

1.6 Future Difections

CHARACTERIZATION OF THE NEAR-SURFACE REGION USING POIARIZATION-SENSITIVE OPTICAL TECHNIQUES

2.1 Introduction

2.2 Ellipsometry

ExperimentallmplementationsofEllipsometry 29, Analysisof

EllipsometryData

2.3 MicrostructuralDeterminationsfromEllipsometryData

Temperature Dependence ofthe Opticat Properties ofSilicon 34,

Determination ofthe Optical Functions ofGlasses Using SE 35,

SpectroscopicEllipsometryStudiesofSi02/Si 37, Spectroscopic

EllipsometryforComplicatedFilmStrucrures 38, Time-Resolved

Ellipsometry 40, Single-WavelengthReal-TimeMonitoringofFilm

Growth 41, Multiple-WavelengthReal-TimeMonitoringofFilm

Growth 42, Infrared EllipsometryStudies ofFilm Growth

THE COMPOSITION, STOICHIOMETRY, AND RELATED MICROSTRUCTURE OF OPTICAL MATERIALS

3.1 Introduction

3.2 AspectsofRamanScattering

3.3 III-VSemiconductor Systems

3.4 GroupIVMaterials

3.5 Amorphous and Microcrystalline Semiconductors

ChalcogenideGlasses 60, GroupIVMicrocrystallineSemiconductors

3.6 Summary

DIAMOND AS AN OPTICAL MATERIAL

4.1 Introduction

4.2 DepositionMethods

4.3 0pticalPropertiesofCVD Diamond

4.4 Defectsin CVD Diamond

4.5 PolishingCVD Diamond

4.6 X-rayWindow

4.7 Summary

PART 2 STABILITY AND MODIFICATION OF FILM AND SURFACE OPTICAL PROPERTIES

MULTIJAYER OPTICAL COATINGS

5.1 Introduction

5.2 Single-LayerOpticalCoatings

OpticaIConstants 90, CompositionMeasurementTechniques

5.3 MultilayerOpticalCoatings

CompositionaIAnalysis 107, SurfaceAnalyticaITechniques 108,

MicrostructuralAnalysis ofMultilayer Optical Coatings

5.4 StabilityofMultilayerOpticalCoatings

5.5 Future Compositional and

MicrostructuralAnalyticaITechniques

CHARACTERIZATION AND CONTROL OF STRESS IN OPTICAL FILMS

6.1 Introduction

6.2 0rigins ofStress

6.3 Techniques for Modifying or Controlling

Film Stress 124

Effect of Deposition Parameters 124, Effect of Ion-Assisted

Deposition 127, Effect of Impurities 127, Effect of Post

Deposition Annealing 128

6.4 Stress Measurement Techniques 130

Substrate Deformation 130, X-Ray Diffraction (XRD) 133,

Raman Spectroscopy 134

6.5 Future Directions 136

SURFACE MODIFICATION OF OPTICAL MATERIALS

7.1 Introduction 141

7.2 Fundamental Processes 142

Ion-Solid Interactions 142, Defect Production, Rearrangement,

and Retention 143

7.3 Ion Implantation of Some Optical Materials 145

Glasses and Amorphous Silica 145, Ix-Quartz (SiO2) 147,

Halides 148, Sapphire (Ix-A1203) 149, LiNbO3 152,

Preparation of Optical Components by Ion Implantation 153

LASER-INDUCED DAMAGE TO OPTICAL MATERIALS

8.1 Introduction 157

8.2 Laser Damage Definition and Statistics 158

Defining Damage 158, Collecting Damage Statistical Data 159,

Types of Damage Probability Distributions 160, Identification of

Pre-Damage Sites 160, Changing the Damage Threshold 161

8.3 In Situ Diagnostics 165

Photothermal Techniques 165, Particle Emission 168

8.4 Postmortem Diagnostics 170

Surface Charge State 170, Surface Phase and Structure Analysis_ "171

8.5 Future Directions 174

APPENDIX~ TECHNIQUE SUMMARIES

1 Auger Electron Spectroscopy (AES) 181

2 Cathodoluminescence(CL) 182

3 Electron Energy-Loss Spectroscopy

in the Transmission Electron Microscope (EELS) 183

4 Energy-Dispersive X-Ray Spectroscopy (EDS) 184

5 Fourier Transform Infrared Spectroscopy (FTIR) 185

6 Light Microscopy 186

7 Modulation Spectroscopy 187

8 Nuclear Reaction Analysis (NRA) 188

9 0p